Granted Patent
Utility
US 6,420,099 · App. 09/366,132
Tungsten hard mask for dry etching aluminum-containing layers
Inventors:
Martin Gutsche, Satish D. Athavale
Patented Case
View Patent ↗
Granted: Jul 16, 2002
Filed: Aug 2, 1999
Inventors
Martin Gutsche
Satish D. Athavale
Assignees (at issue)
Infineon Technologies AG
International Business Machines Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.