Granted Patent
Utility
US 6,420,264 · App. 09/896,160
Method of forming a silicide region in a Si substrate and a device having same
Inventors:
Somit Talwar, Yun Wang
Patented Case
View Patent ↗
Granted: Jul 16, 2002
Filed: Jun 28, 2001
Inventors
Somit Talwar
Yun Wang
Assignee (at issue)
Ultratech Stepper, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.