Granted Patent
Utility
US 6,420,784 · App. 09/740,189
Electrochemical cobalt silicide liner for metal contact fills and damascene processes
Inventors:
Yongjun Jeff Hu, Li Li
Patented Case
View Patent ↗
Granted: Jul 16, 2002
Filed: Dec 19, 2000
Inventors
Yongjun Jeff Hu
Li Li
Assignee (at issue)
Micron Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.