Granted Patent
Utility
US 6,426,232 · App. 09/097,429
Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment
Inventor:
Herbert E. Litvak
Patented Case
View Patent ↗
Granted: Jul 30, 2002
Filed: Jun 15, 1998
Inventor
Herbert E. Litvak
Assignee (at issue)
Luxtron Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.