Granted Patent
Utility
US 6,428,859 · App. 09/812,285
Sequential method for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD)
Inventors:
Tony P. Chiang, Karl Leeser
Patented Case
View Patent ↗
Granted: Aug 6, 2002
Filed: Mar 19, 2001
Inventors
Tony P. Chiang
Karl Leeser
Assignee (at issue)
Angstron Systems, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.