IP Library › Granted Patent US 6,429,459
Granted Patent Utility
US 6,429,459 · App. 09/051,716

Semiconductor component with foreign atoms introduced by ion implantation and process for producing the same

Inventors: Wolfgang Wondrak, Vera Lauer, Nando Kaminski, Raban Held, Gerhard Pensl, Scott Sheppard
Patented Case View Patent ↗
Granted: Aug 6, 2002 Filed: Apr 17, 1998
Inventors
Wolfgang Wondrak
Vera Lauer
Nando Kaminski
Raban Held
Gerhard Pensl
Scott Sheppard
Assignee (at issue)
Daimlerchrysler AG

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Quick Facts
Patent No.
US 6,429,459
App. No.
09/051,716
Filed
1998-04-17
Granted
2002-08-06
Kind
B1