Granted Patent
Utility
US 6,432,205 · App. 09/554,535
Gas feeding system for chemical vapor deposition reactor and method of controlling the same
Inventors:
Kyu Hong Lee, Won Gu Kang, Sang Won Kang
Patented Case
View Patent ↗
Granted: Aug 13, 2002
Filed: May 12, 2000
Inventors
Kyu Hong Lee
Won Gu Kang
Sang Won Kang
Assignee (at issue)
GENITECH, INC.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.