Granted Patent
Utility
US 6,432,790 · App. 09/943,499
Method of manufacturing photomask, photomask, and method of manufacturing semiconductor integrated circuit device
Inventors:
Yoshihiko Okamoto, Masamichi Kobayashi, Satoshi Momose
Patented Case
View Patent ↗
Granted: Aug 13, 2002
Filed: Aug 31, 2001
Inventors
Yoshihiko Okamoto
Masamichi Kobayashi
Satoshi Momose
Assignee (at issue)
HITACHI, LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.