Granted Patent
Utility
US 6,433,432 · App. 09/753,669
Semiconductor device having fluorined insulating film and reduced fluorine at interconnection interfaces and method of manufacturing the same
Inventor:
Masayuki Shimizu
Patented Case
View Patent ↗
Granted: Aug 13, 2002
Filed: Jan 4, 2001
Inventor
Masayuki Shimizu
Assignee (at issue)
Fujitsu Limited
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.