IP Library Granted Patent US 6,436,731
Granted Patent Utility
US 6,436,731 · App. 09/737,056

Method of producing a semiconductor device comprising a cleaning process for removing silicon-containing material

Inventors: Achim Neu, Volker Strutz, Rudiger Uhlmann, Stephan Wege
Patented Case View Patent ↗
Granted: Aug 20, 2002 Filed: Dec 14, 2000
Inventors
Achim Neu
Volker Strutz
Rudiger Uhlmann
Stephan Wege
Assignee (at issue)
Infineon Technologies AG

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Quick Facts
Patent No.
US 6,436,731
App. No.
09/737,056
Filed
2000-12-14
Granted
2002-08-20
Kind
B2