Granted Patent
Utility
US 6,440,753 · App. 09/824,596
Metal hard mask for ILD RIE processing of semiconductor memory devices to prevent oxidation of conductive lines
Inventors:
Xian J. Ning, Joachim Nuetzel
Patented Case
View Patent ↗
Granted: Aug 27, 2002
Filed: Apr 2, 2001
Inventors
Xian J. Ning
Joachim Nuetzel
Assignee (at issue)
Infineon Technologies North America Corp.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.