Granted Patent
Utility
US 6,440,802 · App. 09/940,060
Process for fabricating semiconductor device and photolithography mask
Inventors:
Keiji Hayashi, Masayuki Nagata
Patented Case
View Patent ↗
Granted: Aug 27, 2002
Filed: Aug 28, 2001
Inventors
Keiji Hayashi
Masayuki Nagata
Assignee (at issue)
SHARP KABUSHIKI KAISHA
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.