Granted Patent
Utility
US 6,447,604 · App. 09/605,195
METHOD FOR ACHIEVING IMPROVED EPITAXY QUALITY (SURFACE TEXTURE AND DEFECT DENSITY) ON FREE-STANDING (ALUMINUM, INDIUM, GALLIUM) NITRIDE ((AL,IN,GA)N) SUBSTRATES FOR OPTO-ELECTRONIC AND ELECTRONIC DEVICES
Inventors:
Jeffrey S. Flynn, George R. Brandes, Robert P. Vaudo, David Keogh, Xueping Xu, Barbara E. Landini
Patented Case
View Patent ↗
Granted: Sep 10, 2002
Filed: Jun 28, 2000
Inventors
Jeffrey S. Flynn
George R. Brandes
Robert P. Vaudo
David Keogh
Xueping Xu
Barbara E. Landini
Assignee (at issue)
ADVANCED TECHNOLOGY & MATERIALS CO., LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.