Granted Patent
Utility
US 6,450,200 · App. 10/066,659
Flow control of process gas in semiconductor manufacturing
Inventor:
Louis A. Ollivier
Patented Case
View Patent ↗
Granted: Sep 17, 2002
Filed: Feb 6, 2002
Inventor
Louis A. Ollivier
Assignee (at issue)
Parker-Hannifin Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.