Granted Patent
Utility
US 6,451,707 · App. 09/729,202
Method of removing reaction product due to plasma ashing of a resist pattern
Inventors:
Toshihiko Nagai, Yuichi Miyoshi
Patented Case
View Patent ↗
Granted: Sep 17, 2002
Filed: Dec 5, 2000
Inventors
Toshihiko Nagai
Yuichi Miyoshi
Assignee (at issue)
Matsushita Electronics Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.