Granted Patent
Utility
US 6,461,428 · App. 09/729,669
Method and apparatus for controlling rise and fall of temperature in semiconductor substrates
Inventors:
Shyuji Tobashi, Tadashi Ohashi, Katsuyuki Iwata, Hiroyuki Saito, Shinichi Mitani, Takaaki Honda, Hideki Arai, Yoshitaka Murofushi, Kunihiko Suzuki, Hidenori Takahashi, Hideki Ito, Hirofumi Katsumata
Patented Case
View Patent ↗
Granted: Oct 8, 2002
Filed: Dec 5, 2000
Inventors
Shyuji Tobashi
Tadashi Ohashi
Katsuyuki Iwata
Hiroyuki Saito
Shinichi Mitani
Takaaki Honda
Hideki Arai
Yoshitaka Murofushi
Kunihiko Suzuki
Hidenori Takahashi
Hideki Ito
Hirofumi Katsumata
Assignees (at issue)
Toshiba Ceramics Co., Ltd.
Toshiba Kikai Kabushiki Kaisha
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.