Granted Patent
Utility
US 6,461,776 · App. 10/054,932
Resist pattern forming method using anti-reflective layer, with variable extinction coefficient
Inventors:
Toshihiko Tanaka, Shoichi Uchino, Naoko Asai
Patented Case
View Patent ↗
Granted: Oct 8, 2002
Filed: Jan 25, 2002
Inventors
Toshihiko Tanaka
Shoichi Uchino
Naoko Asai
Assignee (at issue)
HITACHI, LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.