Granted Patent
Utility
US 6,465,303 · App. 09/885,490
Method of manufacturing spacer etch mask for silicon-oxide-nitride-oxide-silicon (SONOS) type nonvolatile memory
Inventors:
Mark T. Ramsbey, Narbeh Derhacobian, Janet Wang, Angela T. Hui, Tuan Pham, Ravi Sunkavalli, Mark Randolph
Patented Case
View Patent ↗
Granted: Oct 15, 2002
Filed: Jun 20, 2001
Inventors
Mark T. Ramsbey
Narbeh Derhacobian
Janet Wang
Angela T. Hui
Tuan Pham
Ravi Sunkavalli
Mark Randolph
Assignee (at issue)
Advanced Micro Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.