Granted Patent
Utility
US 6,465,325 · App. 10/082,944
Process for depositing and planarizing BPSG for dense trench MOSFET application
Inventors:
Rodney S. Ridley, Frank Stensney, John L. Benjamin, Jack H. Linn
Patented Case
View Patent ↗
Granted: Oct 15, 2002
Filed: Feb 26, 2002
Inventors
Rodney S. Ridley
Frank Stensney
John L. Benjamin
Jack H. Linn
Assignee (at issue)
FAIRCHILD SEMICONDUCTOR CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.