Granted Patent
Utility
US 6,465,358 · App. 09/684,550
Post etch clean sequence for making a semiconductor device
Inventors:
Michael S. Nashner, Bruce Beattie
Patented Case
View Patent ↗
Granted: Oct 15, 2002
Filed: Oct 6, 2000
Inventors
Michael S. Nashner
Bruce Beattie
Assignee (at issue)
Intel Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.