Granted Patent
Utility
US 6,472,107 · App. 09/409,454
Disposable hard mask for photomask plasma etching
Inventor:
David Chan
Patented Case
View Patent ↗
Granted: Oct 29, 2002
Filed: Sep 30, 1999
Inventor
David Chan
Assignee (at issue)
PHOTRONICS, INC.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.