Granted Patent
Utility
US 6,472,127 · App. 09/615,055
Method of forming a photoresist pattern
Inventor:
Masaharu Takizawa
Patented Case
View Patent ↗
Granted: Oct 29, 2002
Filed: Jul 12, 2000
Inventor
Masaharu Takizawa
Assignee (at issue)
NEC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.