Granted Patent
Utility
US 6,472,673 · App. 09/363,019
Lithographic method for producing an exposure pattern on a substrate
Inventors:
Alfred Chalupka, Ernst Haugeneder
Patented Case
View Patent ↗
Granted: Oct 29, 2002
Filed: Jul 29, 1999
Inventors
Alfred Chalupka
Ernst Haugeneder
Assignee (at issue)
IMS-Ionen Mikrofabrikationas Systeme
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.