IP Library Granted Patent US 6,479,396
Granted Patent Utility
US 6,479,396 · App. 09/794,055

Dry polymer and oxide veil removal for post etch cleaning

Inventors: Han Xu, Amy Shen, Phillip Clark
Patented Case View Patent ↗
Granted: Nov 12, 2002 Filed: Feb 28, 2001
Inventors
Han Xu
Amy Shen
Phillip Clark
Assignee (at issue)
Infineon Technologies Richmond, LP

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Quick Facts
Patent No.
US 6,479,396
App. No.
09/794,055
Filed
2001-02-28
Granted
2002-11-12
Kind
B1