IP Library Granted Patent US 6,480,017
Granted Patent Utility
US 6,480,017 · App. 09/770,501

Evaluating pattern for measuring an erosion of a semiconductor wafer polished by a chemical mechanical polishing

Inventor: Tadashi Narita
Patented Case View Patent ↗
Granted: Nov 12, 2002 Filed: Jan 29, 2001
Inventor
Tadashi Narita
Assignee (at issue)
OKI ELECTRIC INDUSTRY CO., LTD.

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Quick Facts
Patent No.
US 6,480,017
App. No.
09/770,501
Filed
2001-01-29
Granted
2002-11-12
Kind
B2