Granted Patent
Utility
US 6,481,004 · App. 09/878,286
Circuit pattern design method, exposure method, charged-particle beam exposure system
Inventors:
Ryoichi Inanami, Shunko Magoshi
Patented Case
View Patent ↗
Granted: Nov 12, 2002
Filed: Jun 12, 2001
Inventors
Ryoichi Inanami
Shunko Magoshi
Assignee (at issue)
Kabushiki Kaisha Toshiba
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.