Granted Patent
Utility
US 6,486,077 · App. 09/942,949
Silicon nitride film, semiconductor device, and method for fabricating semiconductor device
Inventor:
Hidekazu Sato
Patented Case
View Patent ↗
Granted: Nov 26, 2002
Filed: Aug 31, 2001
Inventor
Hidekazu Sato
Assignee (at issue)
Fujitsu Limited
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.