IP Library Granted Patent US 6,500,348
Granted Patent Utility
US 6,500,348 · App. 09/782,394

Deep reactive ion etching process and microelectromechanical devices formed thereby

Inventors: Troy Chase, John C. Christenson
Patented Case View Patent ↗
Granted: Dec 31, 2002 Filed: Feb 14, 2001
Inventors
Troy Chase
John C. Christenson
Assignee (at issue)
Delphi Technologies

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Quick Facts
Patent No.
US 6,500,348
App. No.
09/782,394
Filed
2001-02-14
Granted
2002-12-31
Kind
B2