Granted Patent
Utility
US 6,500,487 · App. 09/420,107
Abatement of effluent from chemical vapor deposition processes using ligand exchange resistant metal-organic precursor solutions
Inventors:
Mark Holst, Rebecca Faller, Glenn M. Tom, Jose I. Arno, Ray Dubois
Patented Case
View Patent ↗
Granted: Dec 31, 2002
Filed: Oct 18, 1999
Inventors
Mark Holst
Rebecca Faller
Glenn M. Tom
Jose I. Arno
Ray Dubois
Assignee (at issue)
ADVANCED TECHNOLOGY & MATERIALS CO., LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.