Granted Patent
Utility
US 6,502,530 · App. 09/559,408
Design of gas injection for the electrode in a capacitively coupled RF plasma reactor
Inventors:
Emmanuel Turlot, Jean-Baptiste Chevrier, Jacques Schmitt, Jean Barreiro
Patented Case
View Patent ↗
Granted: Jan 7, 2003
Filed: Apr 26, 2000
Inventors
Emmanuel Turlot
Jean-Baptiste Chevrier
Jacques Schmitt
Jean Barreiro
Assignee (at issue)
Unaxis Balzers Aktiengesellschaft
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.