IP Library › Granted Patent US 6,503,410
Granted Patent Utility
US 6,503,410 · App. 09/613,325

Method of modifying an RF circuit of a plasma chamber to increase chamber life and process capabilities

Inventors: Guy T. Blalock, Kevin G. Donohoe
Patented Case View Patent ↗
Granted: Jan 7, 2003 Filed: Jul 7, 2000
Inventors
Guy T. Blalock
Kevin G. Donohoe
Assignee (at issue)
Micron Technology, Inc.

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Quick Facts
Patent No.
US 6,503,410
App. No.
09/613,325
Filed
2000-07-07
Granted
2003-01-07
Kind
B1