Granted Patent
Utility
US 6,503,791 · App. 09/767,706
Method of manufacturing semiconductor devices utilizing underlayer-dependency of deposition of capacitor electrode film, and semiconductor device
Inventors:
Yuichi Matsui, Masahiko Hiratani, Yasuhiro Shimamoto, Yoshitaka Nakamura, Toshihide Nabatame
Patented Case
View Patent ↗
Granted: Jan 7, 2003
Filed: Jan 24, 2001
Inventors
Yuichi Matsui
Masahiko Hiratani
Yasuhiro Shimamoto
Yoshitaka Nakamura
Toshihide Nabatame
Assignee (at issue)
HITACHI, LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.