Granted Patent
Utility
US 6,506,640 · App. 09/667,686
Multiple channel implantation to form retrograde channel profile and to engineer threshold voltage and sub-surface punch-through
Inventors:
Emi Ishida, Deepak Nayak, Ming-Yin Hao
Patented Case
View Patent ↗
Granted: Jan 14, 2003
Filed: Sep 22, 2000
Inventors
Emi Ishida
Deepak Nayak
Ming-Yin Hao
Assignee (at issue)
Advanced Micro Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.