Granted Patent
Utility
US 6,514,844 · App. 09/840,598
Sidewall treatment for low dielectric constant (low K) materials by ion implantation
Inventors:
Jeremy I. Martin, Eric M. Apelgren, Christian Zistl, Paul R. Besser, Srikantewara Dakshina-Murthy, Jonathan B. Smith, Nick Kepler, Fred Cheung
Patented Case
View Patent ↗
Granted: Feb 4, 2003
Filed: Apr 23, 2001
Inventors
Jeremy I. Martin
Eric M. Apelgren
Christian Zistl
Paul R. Besser
Srikantewara Dakshina-Murthy
Jonathan B. Smith
Nick Kepler
Fred Cheung
Assignee (at issue)
Advanced Micro Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.