IP Library Granted Patent US 6,521,138
Granted Patent Utility
US 6,521,138 · App. 09/873,157

Method for measuring width of bottom under cut during etching process

Inventors: Hung-Chieh Chen, Chun-Yen Chen
Patented Case View Patent ↗
Granted: Feb 18, 2003 Filed: Jun 1, 2001
Inventors
Hung-Chieh Chen
Chun-Yen Chen
Assignee (at issue)
Silicon Integrated Systems Corp.

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Quick Facts
Patent No.
US 6,521,138
App. No.
09/873,157
Filed
2001-06-01
Granted
2003-02-18
Kind
B2