Granted Patent
Utility
US 6,524,875 · App. 10/015,260
Method for manufacturing tapered opening using an anisotropic etch during the formation of a semiconductor device
Inventors:
Thomas A. Figura, Bradley J. Howard
Patented Case
View Patent ↗
Granted: Feb 25, 2003
Filed: Dec 11, 2001
Inventors
Thomas A. Figura
Bradley J. Howard
Assignee (at issue)
Micron Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.