Granted Patent
Utility
US 6,528,341 · App. 09/806,808
Method of forming a sion antireflection film which is noncontaminating with respect to deep-uv photoresists
Inventors:
Patrick J. Schiavone, Frederic Gaillard
Patented Case
View Patent ↗
Granted: Mar 4, 2003
Filed: Jul 18, 2001
Inventors
Patrick J. Schiavone
Frederic Gaillard
Assignee (at issue)
FRANCE TELECOM
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.