Granted Patent
Utility
US 6,530,968 · App. 09/989,021
Chemical mechanical polishing slurry
Inventors:
Yasuaki Tsuchiya, Tomoko Wake, Tetsuyuki Itakura, Shin Sakurai, Kenichi Aoyagi
Patented Case
View Patent ↗
Granted: Mar 11, 2003
Filed: Nov 20, 2001
Inventors
Yasuaki Tsuchiya
Tomoko Wake
Tetsuyuki Itakura
Shin Sakurai
Kenichi Aoyagi
Assignees (at issue)
NEC Electronics Corporation
Tokyo Magnetic Printing Co., LTD
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.