Granted Patent
Utility
US 6,537,837 · App. 09/977,323
Pattern formation method using two alternating phase shift masks
Inventor:
Sung Woo Lee
Patented Case
View Patent ↗
Granted: Mar 25, 2003
Filed: Oct 16, 2001
Inventor
Sung Woo Lee
Assignee (at issue)
SAMSUNG DISPLAY CO., LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.