Granted Patent
Utility
US 6,537,844 · App. 10/087,860
Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server
Inventor:
Masamitsu Itoh
Patented Case
View Patent ↗
Granted: Mar 25, 2003
Filed: Mar 5, 2002
Inventor
Masamitsu Itoh
Assignee (at issue)
Kabushiki Kaisha Toshiba
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.