Granted Patent
Utility
US 6,544,333 · App. 09/842,276
Chemical vapor deposition system for polycrystalline silicon rod production
Inventors:
David W. Keck, Ronald O. Russell, Howard J. Dawson
Patented Case
View Patent ↗
Granted: Apr 8, 2003
Filed: Apr 24, 2001
Inventors
David W. Keck
Ronald O. Russell
Howard J. Dawson
Assignee (at issue)
Advanced Silicon Materials LLC
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.