Granted Patent
Utility
US 6,544,855 · App. 10/041,779
Process flow for sacrificial collar with polysilicon void
Inventors:
Helmut Tews, Rolf Weis, Irene McStay
Patented Case
View Patent ↗
Granted: Apr 8, 2003
Filed: Oct 19, 2001
Inventors
Helmut Tews
Rolf Weis
Irene McStay
Assignee (at issue)
Infineon Technologies AG
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.