Granted Patent
Utility
US 6,544,889 · App. 09/768,151
Method for tungsten chemical vapor deposition on a semiconductor substrate
Inventors:
Hans Vercammen, Joris Baele
Patented Case
View Patent ↗
Granted: Apr 8, 2003
Filed: Jan 24, 2001
Inventors
Hans Vercammen
Joris Baele
Assignee (at issue)
AMI Semiconductor Belgium BVBA
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.