Granted Patent
Utility
US 6,544,892 · App. 10/192,815
Slurry for chemical mechanical polishing silicon dioxide
Inventors:
Ramanathan Srinivasan, Suryadevara V. Babu, William G. America, Yie-Shein Her
Patented Case
View Patent ↗
Granted: Apr 8, 2003
Filed: Jul 10, 2002
Inventors
Ramanathan Srinivasan
Suryadevara V. Babu
William G. America
Yie-Shein Her
Assignee (at issue)
EASTMAN KODAK COMPANY
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.