Granted Patent
Utility
US 6,544,907 · App. 09/689,030
Method of forming a high quality gate oxide layer having a uniform thickness
Inventors:
Yi Ma, Edith Yang
Patented Case
View Patent ↗
Granted: Apr 8, 2003
Filed: Oct 12, 2000
Inventors
Yi Ma
Edith Yang
Assignee (at issue)
Agere Systems Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.