Granted Patent
Utility
US 6,551,940 · App. 08/958,290
Undoped silicon dioxide as etch mask for patterning of doped silicon dioxide
Inventor:
Kei-Yu Ko
Patented Case
View Patent ↗
Granted: Apr 22, 2003
Filed: Oct 27, 1997
Inventor
Kei-Yu Ko
Assignee (at issue)
Micron Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.