Granted Patent
Utility
US 6,558,477 · App. 09/688,757
Removal of photoresist through the use of hot deionized water bath, water vapor and ozone gas
Inventor:
Tim Scovell
Patented Case
View Patent ↗
Granted: May 6, 2003
Filed: Oct 16, 2000
Inventor
Tim Scovell
Assignee (at issue)
Micron Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.