Granted Patent
Utility
US 6,559,012 · App. 09/961,301
Method for manufacturing semiconductor integrated circuit device having floating gate and deposited film
Inventors:
Shoji Shukuri, Norio Suzuki, Yasuhiro Taniguchi
Patented Case
View Patent ↗
Granted: May 6, 2003
Filed: Sep 25, 2001
Inventors
Shoji Shukuri
Norio Suzuki
Yasuhiro Taniguchi
Assignee (at issue)
HITACHI, LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.