Granted Patent
Utility
US 6,559,076 · App. 09/377,070
Method of removing free halogen from a halogenated polymer insulating layer of a semiconductor device
Inventor:
Paul A. Farrar
Patented Case
View Patent ↗
Granted: May 6, 2003
Filed: Aug 19, 1999
Inventor
Paul A. Farrar
Assignee (at issue)
Micron Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.