Granted Patent
Utility
US 6,559,547 · App. 09/663,569
Patterning of content areas in multilayer metalization configurations of semiconductor components
Inventors:
Matthias Lehr, Albrecht Kieslich, Peter Thieme, Lars Voland
Patented Case
View Patent ↗
Granted: May 6, 2003
Filed: Sep 15, 2000
Inventors
Matthias Lehr
Albrecht Kieslich
Peter Thieme
Lars Voland
Assignee (at issue)
Infineon Technologies AG
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.